REDUCING AIRBORNE MOLECULAR CONTAMINATION AND CORROSION RISK
Air Filtration Reduces Airborne Molecular Contamination Risk for Microelectronics Production
Fine particulate and airborne molecular contamination (AMC) control is crucial for high-yield, low-reject semiconductor, microelectronics, and digital technology manufacturing industries. Dust and other microparticles can lead to damaged and rejected inventory, contaminate processes, and short-circuit the microprocessors, chips, and wafers.
Sources of AMC in a producing facility include:
Failures due to AMC are classified as:
Mechanical effects – obstruction of cooling airflow, interference of moving or optical parts, and deforming of surfaces.
Chemical effects – Corrosion of electrical components, due to dust comprised of sulfur- and chlorine-bearing salts.
Electrical effects – impedance changes and electronic circuit conductor bridging.
Creating a pristine cleanroom environment helps to mitigate those failures. A dual-filtration system that employs high-quality prefilters and high-efficiency particulate air (HEPA) filters is recommended for these facilities. Prefilters and secondary filters help eliminate fine airborne particulates, and gas-phase filtration can be added to manage noxious odors that are given off by chemicals.
Optimize Your Filtration and Improve Your Environment
A thorough audit of your facality is the first step that we take, in order to provide you professional guidance and analysis for cost savings and liability reduction. By conducting this audit, we strive to understand your current state and your complete air filtration needs, applications, and goals for total air quality. This customized air filtration survey costs you nothing and could give you significant benefits by helping you save money, reduce risk, and save time.
Contact us to schedule an audit and to find out how the insights from our intelligent data tools, which can can improve operational outcomes and save you time and money.